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Intel’s new chip to advance silicon spin qubit research for quantum computing

A schematic representation shows an electron under 12-qubit quantum dot gates. Fabricated on 300-millimeter wafers, Tunnel Falls leverages Intel’s most advanced transistor fabrication capabilities, such as extreme ultraviolet lithography (EUV) and advanced materials processing techniques. This makes the chip a single electron transistor and allows Intel to fabricate Tunnel Falls with few changes to a standard complementary metal oxide semiconductor (CMOS) logic processing line. (Source: Intel Corporation) arrow forward Image Zoom
A schematic representation shows an electron under 12-qubit quantum dot gates. Fabricated on 300-millimeter wafers, Tunnel Falls leverages Intel’s most advanced transistor fabrication capabilities, such as extreme ultraviolet lithography (EUV) and advanced materials processing techniques. This makes the chip a single electron transistor and allows Intel to fabricate Tunnel Falls with few changes to a standard complementary metal oxide semiconductor (CMOS) logic processing line. (Source: Intel Corporation)
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