Toshiba Electronic Devices & Storage Corporation has launched “TPH2R70AR5,” a 100V N-channel power MOSFET fabricated with U-MOS11-H, Toshiba’s latest-generation process1). The MOSFET targets applications such as switched-mode power supplies for industrial equipment used in data centers and communications base stations.
Toshiba will continue to expand its lineup of low-loss MOSFETs that enable more efficient power supplies and contribute to lower equipment power consumption.
The 100V U-MOS11-H series improves on the drain-source On-resistance (RDS(ON)), total gate charge (Qg) and the trade-off between them (RDS(ON)×Qg) delivered by Toshiba’s existing generation process, the U-MOSX-H series, reducing both conduction and switching power losses.
TPH2R70AR5 offers approximately 8% lower RDS(ON) and 37% lower Qg against TPH3R10AQM, a U-MOSX-H series product, plus a 42% improvement in RDS(ON)×Qg. It also achieves high-speed body diode performance through the application of lifetime control technology2), which reduces reverse recovery charge (Qrr) and suppresses spike voltage. Qrr is improved by approximately 38% and the RDS(ON)×Qrr is also improved by approximately 43%. These industry-leading3) trade-off characteristics4), both RDS(ON)×Qg and RDS(ON)×Qrr, minimize power loss, contributing to higher efficiency and power density in power supply systems. It also adopts the SOP Advance(N) package and offers excellent mounting compatibility with industry standards.
Toshiba also offers circuit design support tools: the G0 SPICE model, which verifies circuit function in a short time; and highly accurate G2 SPICE model that accurately reproduces transient characteristics. All are now available.
Toshiba will continue to expand its lineup of low-loss MOSFETs that enable more efficient power supplies and contribute to lower equipment power consumption.
Notes:
1) As of September 2025, among Toshiba’s process technologies for low-voltage power MOSFETs. Toshiba survey.
2) Lifetime control technology: Intentionally shortening the carrier lifetime by using an ion beam to introduce defects into the semiconductor enhances switching speed, which improves the recovery speed of the diode and reduces noise.
3) As of September 2025, comparison with other 100V N-channel power MOSFETs for industrial equipment. Toshiba survey.
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