SEMICONDUCTOR PROCESSING Single-wafer tool for cleaning and etching

Related Vendors

ROHM Semiconductor GmbH

Rogers Corporation

CISSOID S.A.

RENA Technologies launches Vanguard, a automated single-wafer platform for wet chemical cleaning, etching, and drying of 200 mm and 300 mm wafers. Designed to support established wet-processing workflows and accommodate different production requirements.

Vanguard is developed to address the increasing demands of advanced semiconductor substrates and materials. Supporting 4 to 8 independent processing chambers within a compact footprint, the system delivers high throughput without compromising cleanroom space. Its chemical cleaning and double-sided processing—handling up to five distinct chemistries. These features are designed to support process consistency and compatibility with semiconductor manufacturing requirements.

"With the launch of our new semiconductor wet processing platform, we are entering a new aera in precision, efficiency, and reliability for advanced chip manufacturing. This machine embodies our commitment to innovation—delivering not only superior process control but also the flexibility our customers need to stay ahead in a rapidly evolving industry. It represents a decisive step in enabling the next generation of semiconductor technologies for both high-volume manufacturing lines and R&D fabs." Emphasizes Peter Schneidewind, CEO of RENA Technologies.

Scalable, modular design

Fabs can easily adjust chamber count and process configurations to match evolving requirements, from R&D to high-volume production. The platform integrates internal chemistry preparation for formulation control, ensuring consistent process delivery and minimizing chemical consumption. This reduces operating costs and environmental impact.

Serviceability is also built-in: each chamber operates independently, allowing maintenancewithout halting production. Combined with AI-assisted process control, and the digital service platform RENA Connect Hub, customers gain uptime and efficiency.

The platform allows fabs to adjust chamber count and process configurations depending on production or R&D needs. It integrates internal chemistry preparation for controlled formulation and consistent delivery, which can help reduce chemical usage compared to conventional setups. Each chamber operates independently, enabling maintenance without interrupting other processes. Combined with AI-assisted process control and the digital service platform RENA Connect Hub, the system supports continuous operation and monitoring.

PROJECT GENESIS

Minimizing the ecological footprint in Europe’s semiconductor industry

Automation and compatibility

With its digital twin simulation, customers can model system integration, test interfaces, and simulate throughput with real process data before installation. Training and upgrades can be conducted seamlessly during live production.

Fully compatible with GEM300, the system can be integrated from the outset. It operates in a Class 1 mini-environment, enabling clean wafer handling. The drying processes minimize residues and help maintain surface quality for subsequent processing steps.

Key features

• Fully automated wet processing for 200mm / 300mm wafers

• Scalable from 4 to 8 single-wafer chambers

• Double-sided cleaning with up to 5 chemicals

• Internal chemistry preparation system

• AI-assisted software with predictive maintenance

• Advanced drying technology

• Class 1 mini environment for ultra-clean operation

• Compact footprint with high-throughput capability

• GEM300 factory-integration ready

• Low chemical usage for reduced cost and environmental impact

(ID:50644288)